The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Feb. 24, 2022
Applicant:

Cymer, Llc, San Diego, CA (US);

Inventors:

Russell Allen Burdt, San Diego, CA (US);

Kumar Raja Guvindan Raju, San Diego, CA (US);

Matthew Minakais, San Diego, CA (US);

David Wesley Manley, San Diego, CA (US);

Assignee:

Cymer, LLC, San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70975 (2013.01); G03F 7/70025 (2013.01); G03F 7/70525 (2013.01); G03F 7/70533 (2013.01);
Abstract

Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.


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