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For the Inventor, By the Inventor

Vancouver, WA, United States of America

David W Daniel

USPTO Granted Patents = 18

Average Co-Inventor Count = 2.3

ph-index = 16

Forward Citations = 605(Granted Patents)


Location History:

  • Tulsa, OK (US) (1979)
  • Divide, CO (US) (1999 - 2002)
  • Vancouver, WA (US) (2002 - 2006)

Company Filing History:

goldMedal16 out of 3,715 
 
Lsi Logic Corporation
 patents
silverMedal1 out of 31 
 
Symbios, Inc.
 patents
bronzeMedal1 out of 832,680 
Other
 patents

Years Active: 1979-2006

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18 patents (USPTO):Explore Patents
1. 7095483 - Process independent alignment marks (2006-08-22),
2. 6870160 - Method and apparatus for monitoring the condition of a lubricating medium (2005-03-22),
3. 6856029 - Process independent alignment marks (2005-02-15),
4. 6506684 - Anti-corrosion system (2003-01-14),
5. 6372520 - Sonic assisted strengthening of gate oxides (2002-04-16),
6. 6355532 - Subtractive oxidation method of fabricating a short-length and vertically-oriented channel, dual-gate, CMOS FET (2002-03-12),
7. 6354908 - Method and apparatus for detecting a planarized outer layer of a semiconductor wafer with a confocal optical system (2002-03-12),
8. 6316817 - MeV implantation to form vertically modulated N+ buried layer in an NPN bipolar transistor (2001-11-13),
9. 6241847 - Method and apparatus for detecting a polishing endpoint based upon infrared signals (2001-06-05),
10. 6235590 - Fabrication of differential gate oxide thicknesses on a single integrated circuit chip (2001-05-22),
11. 6201253 - Method and apparatus for detecting a planarized outer layer of a semiconductor wafer with a confocal optical system (2001-03-13),
12. 6121147 - Apparatus and method of detecting a polishing endpoint layer of a (2000-09-19),
13. 6096625 - Method for improved gate oxide integrity on bulk silicon (2000-08-01),
14. 6077783 - Method and apparatus for detecting a polishing endpoint based upon heat (2000-06-20),
15. 6069048 - Reduction of silicon defect induced failures as a result of implants in (2000-05-30),

Title: The Innovative Contributions of David W. Daniel

Introduction

David W. Daniel is a notable inventor based in Vancouver, WA (US), recognized for his significant contributions to technology through his 18 patents. His work primarily focuses on advancements in alignment technologies and monitoring systems for lubricating mediums.

Latest Patents

Among his latest patents is the "Process Independent Alignment Marks," which describes an apparatus designed for aligning a mask with an image to a substrate. This innovative device includes a mask support and a substrate support, along with an alignment means that ensures precise positioning. Another significant patent is the "Method and Apparatus for Monitoring the Condition of a Lubricating Medium." This invention utilizes a UV light source and receiver to analyze the condition of lubricating mediums, providing valuable insights into their performance.

Career Highlights

David has had a distinguished career, working with prominent companies such as LSI Logic Corporation and Symbios, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of technology in his field.

Collaborations

Throughout his career, David has collaborated with notable individuals, including John W. Gregory and John J. Seliskar. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

David W. Daniel's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in alignment and monitoring systems, showcasing the importance of innovation in today's technological landscape.

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