David Uliel

Title: David Uliel and His Semiconductor Inspection Innovations.

Introduction

David Uliel is an inventor based in Tel-Mond, Israel. His work focuses on electron-beam imaging and the examination of semiconductor specimens. He is associated with Applied Materials Israel Limited and holds 2 patents.

Latest Patents

Uliel’s patent portfolio includes two inventions related to electron-beam inspection.

Electron Beam Spot Shape Reconstruction Unit. This invention reconstructs the shape of an electron-beam spot using images of circular targets captured at different polar angles. A processing circuit analyzes the images to determine edge-width information along two axes, then uses that information to reconstruct the spot’s shape.

Image Generation for Examination of a Semiconductor Specimen. This system and method generate an image of a semiconductor specimen from frames acquired by scanning the specimen from multiple directions. Frames from each direction are first registered and combined into composite frames. Those composites are then registered and combined to produce the final specimen image.

Career Highlights

Uliel’s patented work addresses image reconstruction and registration, two important processes in electron-beam-based semiconductor inspection. His inventions describe methods for deriving useful specimen and beam information from multiple images and scan directions.

Collaborations

Uliel is associated with Applied Materials Israel Limited. His listed coworkers include Yan Avniel and Gal Daniel Gutterman.

Conclusion

David Uliel’s two patents focus on improving electron-beam spot reconstruction and image generation for semiconductor examination, reflecting his contributions to inspection technologies at Applied Materials Israel Limited.