Company Filing History:
Years Active: 1998-2000
Title: David T. Krick: Innovator in Semiconductor Technology
Introduction
David T. Krick is a notable inventor based in Hillsboro, OR (US), recognized for his contributions to semiconductor technology. He holds a total of 3 patents, showcasing his innovative approach to solving complex engineering challenges.
Latest Patents
Among his latest patents is a method for forming a trench isolation structure in a semiconductor substrate. This process involves etching a trench into the substrate, followed by the formation of an oxide layer within the trench. The surface of this oxide layer is treated with a nitrogen plasma, which enhances its properties. Subsequently, another oxide layer is deposited over the nitrogen-rich surface of the first oxide layer using a chemical vapor deposition (CVD) process, primarily utilizing a reactant gas other than ozone. This innovative approach aims to improve the performance and reliability of semiconductor devices.
Career Highlights
David T. Krick is currently employed at Intel Corporation, a leading company in the semiconductor industry. His work at Intel has allowed him to develop and refine his patented technologies, contributing to advancements in the field.
Collaborations
Throughout his career, David has collaborated with several talented individuals, including Peter K. Moon and Kerry L. Spurgin. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
David T. Krick's work in semiconductor technology exemplifies the spirit of innovation. His patents and contributions to Intel Corporation highlight his commitment to advancing the field and improving the performance of electronic devices.