David R Johnson

Title: Innovations of David R Johnson

Introduction

David R Johnson is a prominent inventor based in Meridian, ID (US). He has made significant contributions to the field of technology, particularly in the areas of material detection and plasma etching. With a total of 11 patents to his name, Johnson's work has had a substantial impact on the semiconductor industry.

Latest Patents

One of Johnson's latest patents is a "Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light." This invention provides a method for detecting specific materials, such as photo-resist material, on sample surfaces. By projecting a narrow beam of light onto the sample, the fluoresced and/or reflected light intensity is measured, allowing for precise material detection. This method is particularly beneficial for semiconductor wafer applications.

Another notable patent is the "Method and apparatus for plasma etching a wafer." This invention involves a plasma etching machine that utilizes a process chamber with a unique design. The machine includes a cooled chuck and a lift mechanism that allows for efficient wafer handling during the etching process. The integration of RF power for gas ionization further enhances the machine's capabilities, making it a valuable tool in semiconductor manufacturing.

Career Highlights

David R Johnson is currently employed at Micron Technology Incorporated, where he continues to innovate and develop new technologies. His expertise in material detection and plasma etching has positioned him as a key player in the industry. Johnson's work not only advances technological capabilities but also contributes to the efficiency and effectiveness of semiconductor production.

Collaborations

Throughout his career, Johnson has collaborated with notable colleagues, including Joe Lee Phillips and Peter S Frank. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

David R Johnson's contributions to the field of technology, particularly in material detection and plasma etching, have established him as a leading inventor. His patents reflect a commitment to advancing the semiconductor industry and improving manufacturing processes. Johnson's work continues to inspire future innovations in technology.