This inventor holds 4 USPTO granted patents. Top assignees: Kla-Tencor Technologies Corporation, Kla Tencor Corporation. Active years: 2004-2007.
Company Filing History:
3 out of 641 
1 out of 1,787 
Years Active: 2004-2007
Title: David R Bakker: Innovator in Semiconductor Defect Analysis
Introduction
David R Bakker is a notable inventor based in Cupertino, CA, with a focus on innovations in semiconductor defect analysis. He holds a total of 4 patents that contribute significantly to the field of image processing and classification.
Latest Patents
Among his latest patents is an innovative apparatus and methods for searching through and analyzing defect images and wafer maps. This invention discloses methods and apparatus for automatically organizing and analyzing a plurality of defect images without the need for a predefined set of classified images. The defect images are sorted based on associated identifying data, such as fabrication identifier and lot number, into various groups. This allows for efficient searching of images that resemble a specified target image by comparing feature vectors. Another significant patent is a power-assisted automatic supervised classifier creation tool for semiconductor defects. This system enables users to view image defects organized by natural groupings, facilitating the classification of images into a training set. The automatic classifier uses stored feature vectors to classify images not included in the training set, enhancing the accuracy of defect identification.
Career Highlights
David has worked with prominent companies in the semiconductor industry, including Kla-Tencor Technologies Corporation and Kla Tencor Corporation. His contributions have been instrumental in advancing the methodologies used in defect analysis and classification.
Collaborations
Throughout his career, David has collaborated with notable professionals such as Ian R Smith and Gabor D Toth, further enriching his work in the field.
Conclusion
David R Bakker's innovative contributions to semiconductor defect analysis through his patents and collaborations have made a significant impact in the industry. His work continues to influence advancements in image processing and classification techniques.