Boise, ID, United States of America

David R Atwell

This inventor holds 14 USPTO granted patents and 1 published patent application. Top assignee: Micron Technology Incorporated. Active years: 1997-2013.

USPTO Granted Patents = 14 

% Patents Active = 85.7

Average Co-Inventor Count = 1.6

ph-index = 8

Forward Citations = 274(Granted Patents)


Company Filing History:


Years Active: 1997-2013

Loading Chart...
14 patents (USPTO):Explore Patents

Title: David R Atwell: Pioneering Innovator in Material Deposition Systems

Introduction:

David R Atwell, a renowned inventor based in Boise, ID, stands as a testament to the power of innovation and the significant impact that one individual can have on the world. With a strong dedication to pushing the boundaries of what is possible, Atwell has made significant contributions to the field of material deposition systems.

Latest Patents:

Atwell's latest patents include "Chemical vaporizer for material deposition systems and associated methods," which focus on novel methods for operating a material deposition system. These patents showcase Atwell's expertise in developing cutting-edge technologies that enhance the efficiency and effectiveness of material deposition processes.

Career Highlights:

With an impressive portfolio of 14 patents to his name, David R Atwell has carved a niche for himself in the field of technological innovation. His work at Micron Technology Incorporated has been instrumental in advancing the capabilities of material deposition systems, contributing to the growth and development of the industry.

Collaborations:

Throughout his career, Atwell has collaborated with esteemed colleagues such as Eugene P Marsh and Brian A Vaartstra. These collaborations have led to the creation of groundbreaking technologies and solutions that have significantly impacted the field of material deposition systems.

Conclusion:

In conclusion, David R Atwell's innovative spirit and relentless dedication to innovation have positioned him as a pioneering figure in the realm of material deposition systems. His patents and collaborations serve as a testament to his expertise and commitment to pushing the boundaries of technological advancement. Atwell's contributions continue to inspire future generations of inventors and innovators to explore new possibilities and drive meaningful change in the world of technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…