David Peter Klaus

Title: David Peter Klaus: Innovator in Lithographic Technologies

Introduction

David Peter Klaus is a prominent inventor based in Yorktown Heights, NY (US). He has made significant contributions to the field of lithography, particularly in the development of advanced resist compositions. With a total of 4 patents, Klaus has established himself as a key figure in the innovation of materials used in high-resolution lithographic applications.

Latest Patents

Klaus's latest patents include a high-resolution silicon-containing resist, which features non-chemically amplified radiation-sensitive resist compositions. These compositions are particularly useful for lithographic applications, especially E-beam lithography. The technology allows for the patterning of sub-50 nm features with minimal blur. Another notable patent is a method for using negative tone silicon-containing resist for E-beam lithography. This invention involves polymeric components that enhance negative lithographic processes, particularly in mask-making and direct-write techniques. The negative resists developed by Klaus also demonstrate reduced incidence of image collapse at smaller ground rules.

Career Highlights

David Peter Klaus is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of lithographic technology. His work has been instrumental in advancing the capabilities of E-beam lithography, making it more efficient and effective for various applications.

Collaborations

Throughout his career, Klaus has collaborated with notable colleagues, including Cyril Cabral, Jr. and Patrick William Dehaven. These partnerships have contributed to the successful development of innovative technologies in the field.

Conclusion

David Peter Klaus is a distinguished inventor whose work in lithographic technologies has had a profound impact on the industry. His patents reflect a commitment to innovation and excellence, positioning him as a leader in the field.