Company Filing History:
Years Active: 2005-2006
Title: Innovations by David Perry
Introduction
David Perry is an accomplished inventor based in Crawfordsville, IN (US), known for his significant contributions to the field of chemical-mechanical planarization (CMP). With a total of seven patents to his name, Perry has developed innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
One of Perry's latest patents is a gradient polishing pad made from paper-making fibers for use in chemical/mechanical planarization of wafers. This composite polishing pad is designed with a fibrous matrix of paper-making fibers bound with resin material. It consists of a top section and one or more lower sections, each with unique material properties. The polishing performance can be significantly improved by modifying the characteristics of each layer, allowing for a higher modulus material in the top layer compared to the lower layers.
Another notable patent is the retaining ring with a wear pad for use in chemical mechanical planarization. This innovative retaining ring features a wear pad constructed to provide improved resistance to wear and degradation compared to existing products. It can withstand increased operating temperatures and pressures, which accelerates the material removal rate from semiconductor wafers. Additionally, this design allows for retrofitting to previously used retaining rings, reducing costs and enhancing the longevity of CMP processing apparatus.
Career Highlights
Throughout his career, David Perry has worked with Raytech Innovative Solutions, LLC, where he has applied his expertise in developing advanced CMP technologies. His work has contributed to significant advancements in the semiconductor manufacturing industry.
Collaborations
Perry has collaborated with notable individuals such as Paul Fathauer and Richard D Cooper, further enhancing the impact of his innovations in the field.
Conclusion
David Perry's contributions to the field of chemical-mechanical planarization through his innovative patents demonstrate his commitment to advancing semiconductor manufacturing technologies. His work continues to influence the industry, providing solutions that improve efficiency and reduce costs.