The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Mar. 01, 2002
Richard D. Cooper, Sullivan, IN (US);
Paul Fathauer, Sullivan, IN (US);
Angela Mroczek-petroski, Crawfordsville, IN (US);
David Perry, Crawfordsville, IN (US);
James J. Petroski, Crawfordsville, IN (US);
Richard D. Cooper, Sullivan, IN (US);
Paul Fathauer, Sullivan, IN (US);
Angela Mroczek-Petroski, Crawfordsville, IN (US);
David Perry, Crawfordsville, IN (US);
James J. Petroski, Crawfordsville, IN (US);
Raytech Innovative Solutions, Inc., Sullivan, IN (US);
Abstract
A polishing pad for use in chemical mechanical polishing of substrates that being made of fibrous matrix such as cellulose with a binder consisting of thermoset resin material, such as phenolic resin. The polishing surface is ground to form asperities. The polishing pad provides a porous structure by which polishing slurry and polishing debris during chemical mechanical polishing of substrates are stored for subsequent rinsing away, and for enhanced flow-distribution of the polishing slurry. Also disclosed is a method of making the polishing pad.