Company Filing History:
Years Active: 2005
Title: Innovations of Angela Mroczek-Petroski
Introduction
Angela Mroczek-Petroski is a notable inventor based in Crawfordsville, Indiana. She has made significant contributions to the field of semiconductor manufacturing, particularly through her innovative designs in retaining rings used in chemical mechanical planarization (CMP). With a total of three patents to her name, her work has had a substantial impact on the efficiency and cost-effectiveness of semiconductor production.
Latest Patents
One of her latest patents is a retaining ring with a wear pad specifically designed for use in chemical mechanical planarization. This novel retaining ring features a wear pad constructed from materials that provide improved resistance to wear and degradation compared to existing products. The design allows it to withstand higher operating temperatures and pressures at the polishing surface of semiconductor wafers, resulting in less wear than traditional materials. This capability can accelerate the material removal rate during semiconductor processing, offering manufacturers greater flexibility in their operations. Additionally, the retaining ring can be retrofitted to previously used designs, which helps in reducing costs by salvaging major components of CMP processing apparatus. The replaceable nature of the consumable component further enhances its cost-effectiveness.
Career Highlights
Angela has worked with Raytech Innovative Solutions, LLC, where she has applied her expertise in developing innovative solutions for semiconductor manufacturing. Her contributions have been instrumental in advancing the technology used in this critical industry.
Collaborations
Angela has collaborated with notable professionals in her field, including Richard D. Cooper and Paul Fathauer. Their combined efforts have contributed to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Angela Mroczek-Petroski's innovations in retaining ring design for chemical mechanical planarization demonstrate her commitment to enhancing semiconductor manufacturing processes. Her work not only improves efficiency but also reduces costs, making a significant impact on the industry.