The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6964601 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 15, 2005

Filed:

Jul. 09, 2003
Applicants:

Angela Petroski, Crawfordsville, IN (US);

Richard D. Cooper, Williston Pk, NY (US);

Paul Fathauer, Sullivan, IN (US);

David Perry, Crawfordsville, IN (US);

James Macey, Crawfordsville, IN (US);

Inventors:

Angela Petroski, Crawfordsville, IN (US);

Richard D. Cooper, Williston Pk, NY (US);

Paul Fathauer, Sullivan, IN (US);

David Perry, Crawfordsville, IN (US);

James Macey, Crawfordsville, IN (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24D017/00 ;
U.S. Cl.
CPC ...
Abstract

The present invention is related to a method for securing a polishing pad to the platen for use in chemical-mechanical polishing. Specifically, a polishing pad is attached to a platen using a reclosable, hook-and-pile fastener, whereby the platen-attachment fastener may be reused. Separate embodiments are disclosed for attaching porous and nonporous polishing pads.


Find Patent Forward Citations

Petroski, Angela. (2005). Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers (U.S. Patent No. 6964601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6964601

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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