This inventor holds 2 USPTO granted patents. Top assignee: Surface Technology Systems Plc. Active years: 2000-2001.
Company Filing History:
Years Active: 2000-2001
Title: David Mark Haynes: Innovator in Semiconductor Technology
Introduction
David Mark Haynes is a notable inventor based in Risca, GB. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to surface treatment methods.
Latest Patents
Haynes' latest patents include a method of surface treatment of semiconductor substrates. This invention involves depositing a sidewall passivation layer on an etched feature in a semiconductor substrate using a hydrocarbon deposition gas. The process includes determining specific mixture percentages for the hydrocarbon gas to optimize the etch rate of the substrate. By maintaining the mixture percentage within a selected range, high aspect-ratio features in a semiconductor substrate can be produced through alternating etching and deposition processes.
Career Highlights
David Mark Haynes is currently employed at Surface Technology Systems Plc, where he continues to advance semiconductor technology. His work focuses on enhancing the efficiency and effectiveness of semiconductor substrate treatments.
Collaborations
Haynes collaborates with talented individuals such as Martin Edward Ryan and Huma Ashraf, contributing to a dynamic work environment that fosters innovation.
Conclusion
David Mark Haynes is a prominent figure in semiconductor technology, with a strong portfolio of patents that reflect his expertise and innovative spirit. His contributions are paving the way for advancements in the industry.