David M Rowell

Title: Innovations by David M Rowell

Introduction

David M Rowell is a notable inventor based in Billerica, MA (US). He has made significant contributions to the field of semiconductor processing, holding a total of 5 patents. His work focuses on enhancing the efficiency and safety of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is for a process tube with in-situ gas preheating. This innovative semiconductor wafer furnace process tube includes gas delivery lines that wind around the circumference of the tube in a non-product region. This design allows the gas to absorb energy from the non-product region, minimizing cooling effects on the wafers in the product region. Another significant patent is for a fast, safe pyrogenic external torch assembly. This assembly provides pure steam for semiconductor processing and includes a gas injection nozzle subassembly, a pulse heater subassembly, and a compressed-air-cooled heat-exchanging jacket subassembly. This invention is designed to be easily integrated with existing semiconductor processing furnaces, enhancing their operational efficiency.

Career Highlights

David has worked with several companies throughout his career, including Dynamet Technology, Inc. and Kokusai Bti Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

David has collaborated with notable individuals in the industry, including Stanley Abkowitz and Harold L Heussi. These collaborations have likely enriched his work and contributed to the advancements in semiconductor processing technologies.

Conclusion

David M Rowell's contributions to semiconductor processing through his innovative patents and collaborations highlight his significant role in the field. His work continues to influence the efficiency and safety of semiconductor manufacturing processes.