Gulph Mills, PA, United States of America

David Kolesar


Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2007-2016

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations by David Kolesar in Chemical Mechanical Polishing

Introduction

David Kolesar is an accomplished inventor based in Gulph Mills, PA (US). He has made significant contributions to the field of chemical mechanical polishing, holding three patents that showcase his innovative methods. His work is particularly relevant in industries that require precise substrate polishing, such as electronics and optics.

Latest Patents

Kolesar's latest patents focus on methods of manufacturing chemical mechanical polishing layers. One of his patents describes a method that involves providing a liquid prepolymer material and a plurality of hollow microspheres. The process includes exposing these microspheres to a carbon dioxide atmosphere to create treated hollow microspheres. These are then combined with the liquid prepolymer to form a curable mixture, which undergoes a reaction to create a cured material. The resulting polishing layer is specifically designed for substrates like magnetic, optical, and semiconductor materials. Another patent outlines a similar method but involves exposing the microspheres to a vacuum before treating them with carbon dioxide. This innovative approach enhances the properties of the polishing layers, making them more effective for various applications.

Career Highlights

David Kolesar is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc. His role at the company allows him to apply his expertise in chemical mechanical polishing, contributing to advancements in the field. His innovative methods have the potential to improve the efficiency and effectiveness of polishing processes in various industries.

Collaborations

Kolesar has collaborated with notable colleagues, including Robert L. Post and Alan Saikin. These partnerships have likely fostered a creative environment that encourages the development of cutting-edge technologies in chemical mechanical polishing.

Conclusion

David Kolesar's contributions to the field of chemical mechanical polishing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to impact industries that rely on precise substrate polishing techniques.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…