David Hoglund

Title: David Hoglund: Innovator in Ion Implantation Technologies

Introduction

David Hoglund is an accomplished inventor based in Arlington, MA, known for his significant contributions to ion implantation technologies. With a total of three patents to his name, David's work has played a pivotal role in advancing ion beam applications.

Latest Patents

David Hoglund's latest inventions include:

1. **Lower Dose Rate Ion Implantation Using a Wider Ion Beam** - This innovative process involves generating an ion beam with the help of an ion source and a strategically positioned extraction manipulator. The method emphasizes maximizing the current of the ion beam by maintaining an optimal gap distance from the exit aperture of the ion source, which may differ by at least 10 percent from the intended measurement.

2. **Medium Current Ribbon Beam for Ion Implantation** - In this patent, David offers a method for establishing a medium current ribbon beam for ion implantation. The approach includes utilizing a mass analyzing magnet to separate the process ion beam from a support gas beam. The intensity of the process ion beam can be finely tuned by adjusting the gas ratios in the ion source.

Career Highlights

Throughout his career, David has contributed to notable companies such as Axcelis Technologies, Inc. and Advanced Ion Beam Technology, Inc.. His expertise and innovative mindset have allowed him to remain at the forefront of ion implantation technology.

Collaborations

David Hoglund has had the opportunity to work alongside esteemed colleagues, including Robert E. Kaim and Kourosh Saadatmand. These collaborations have further enriched his inventive capabilities and expanded the impact of his work in the field.

Conclusion

David Hoglund exemplifies the spirit of innovation through his patents and collaborative efforts. His advancements in ion implantation technology are set to influence various applications, reinforcing his reputation as a leading inventor in the industry.