Dresden, Germany

David Haggart

This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Haggart. Retrieved from https://idiyas.com/inventor/david-haggart

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: David Haggart: Innovator in Semiconductor Polishing Technology

Introduction

David Haggart is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of polishing processes.

Latest Patents

Haggart holds a patent for a "Polishing head for wafer, and method for polishing." This innovative polishing head is designed for a chemical-mechanical polishing machine that securely holds a semiconductor wafer against a polishing pad. The device features a chuck with a pressure chamber that applies a down force uniformly to the wafer's backside. Additionally, an electrode arrangement within the chamber is coplanar to the wafer, allowing for compensation of any irregularities in the wafer or chuck by applying a force distribution that corresponds to these irregularities.

Career Highlights

David Haggart is associated with Motorola Corporation, where he has been instrumental in advancing semiconductor polishing technologies. His work has contributed to improving the efficiency and effectiveness of wafer polishing processes.

Collaborations

Haggart has collaborated with notable colleagues, including Walter Glashauser and Lutz Teichgräber, who have also contributed to advancements in semiconductor technologies.

Conclusion

David Haggart's innovative work in semiconductor polishing technology exemplifies the importance of precision in the manufacturing process. His contributions continue to influence the industry and enhance the performance of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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