Rowland Heights, CA, United States of America

David G Mikolas


Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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2 patents (USPTO):Explore Patents

Title: David G Mikolas: Innovator in Particle Processing Technologies

Introduction

David G Mikolas is a prominent inventor based in Rowland Heights, California. He has made significant contributions to the field of particle processing, holding a total of 2 patents. His work focuses on developing innovative technologies that enhance the efficiency and effectiveness of particle processing methods.

Latest Patents

Mikolas's latest patents include a "Particle Processing Apparatus and Methods" and a "Global Planarization Method." The particle processing apparatus is designed to process particles through a sophisticated system that includes a particle source, extraction and acceleration electrodes, and a processing compartment. This invention not only improves the processing of particles but also introduces new methods for handling them effectively. The global planarization method addresses the challenges of manufacturing substrates with complex features by utilizing reverse mask etching and chemical mechanical planarization techniques.

Career Highlights

David G Mikolas is associated with Cabot Microelectronics Corporation, where he applies his expertise in particle processing technologies. His innovative approaches have contributed to advancements in the industry, making him a valuable asset to his company.

Collaborations

Mikolas has collaborated with notable colleagues, including Jui-Kun Lee and Chris Chang Yu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

David G Mikolas is a distinguished inventor whose work in particle processing has led to significant advancements in the field. His patents reflect his commitment to innovation and his contributions to the industry will continue to influence future developments.

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