The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2005

Filed:

Jul. 11, 2002
Applicants:

Jui-kun Lee, Hoffman Estates, IL (US);

Chris C. Yu, Conneautville, PA (US);

David G. Mikolas, Rowland Heights, CA (US);

Inventors:

Jui-Kun Lee, Hoffman Estates, IL (US);

Chris C. Yu, Conneautville, PA (US);

David G. Mikolas, Rowland Heights, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/302 ;
U.S. Cl.
CPC ...
Abstract

Methods for manufacturing substrates with difficult to polish features using reverse mask etching and chemical mechanical planarization techniques.


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