The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2005
Filed:
Jul. 11, 2002
Applicants:
Jui-kun Lee, Hoffman Estates, IL (US);
Chris C. Yu, Conneautville, PA (US);
David G. Mikolas, Rowland Heights, CA (US);
Inventors:
Jui-Kun Lee, Hoffman Estates, IL (US);
Chris C. Yu, Conneautville, PA (US);
David G. Mikolas, Rowland Heights, CA (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/302 ;
U.S. Cl.
CPC ...
Abstract
Methods for manufacturing substrates with difficult to polish features using reverse mask etching and chemical mechanical planarization techniques.
Lee, Jui-Kun. (2005). Global planarization method (U.S. Patent No. 6884729). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6884729
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile