Company Filing History:
4 out of 788 
1 out of 30,982 
Years Active: 1982-1991
Title: The Innovative Contributions of David E Moss
Introduction
David E Moss is a notable inventor based in Kokomo, Indiana, who has made significant contributions to the field of semiconductor technology. With a total of five patents to his name, Moss has developed innovative methods that enhance the functionality and efficiency of semiconductor structures.
Latest Patents
Among his latest patents is a method of forming a semiconductor stalk structure through epitaxial growth. This process involves creating a moat with a flat bottom and tapered side walls in a monocrystalline silicon substrate. An oxide layer is then grown over the moat's side walls and bottom, which is selectively removed to expose the silicon. An epitaxial stalk is subsequently grown on the silicon, achieving a height that aligns with the substrate's top surface. Another significant patent by Moss details a method for creating a semiconductive structure that serves as a pressure sensor. This pressure sensor utilizes a monocrystalline silicon chip featuring a diaphragm with strain gauges that overlay a buried cavity, formed through a specialized semiconductor fabrication process.
Career Highlights
David E Moss has worked with prominent companies in the technology sector, including Delco Electronics Corporation and General Motors Global Technology Operations LLC. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Moss has collaborated with several talented individuals throughout his career, including Diane W Sidner and Douglas J Yoder. These partnerships have fostered an environment of innovation and creativity, leading to the development of his impactful patents.
Conclusion
David E Moss stands out as a significant figure in the realm of semiconductor innovation. His patents reflect a deep understanding of technology and a commitment to advancing the field. His contributions continue to influence the industry and inspire future inventors.