This inventor holds 1 USPTO granted patent. Top assignee: Mattson Technology, Inc. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Innovations by David Dutton in Integrated Circuit Manufacturing
Introduction
David Dutton is an accomplished inventor based in Tracy, California. He has made significant contributions to the field of integrated circuit manufacturing, particularly in the area of photoresist removal techniques. His innovative approach has the potential to enhance the efficiency and effectiveness of transistor fabrication processes.
Latest Patents
David Dutton holds a patent for a "System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing." This patent describes a technique that utilizes a photoresist layer prior to forming an electrical interconnect structure on an active device structure. The method involves exposing the photoresist and related residues to reactive species generated from a gas mixture, predominantly hydrogen gas, in a plasma source. This continuous exposure allows for the effective removal of photoresist and residues, thereby improving the overall fabrication process.
Career Highlights
David Dutton is currently associated with Mattson Technology, Inc., where he applies his expertise in semiconductor manufacturing. His work focuses on developing advanced techniques that streamline the production of integrated circuits. With a patent portfolio that includes 1 patent, Dutton has established himself as a key player in the industry.
Collaborations
David has collaborated with notable colleagues such as Stephen E Savas and Songlin Xu. Their combined efforts contribute to the advancement of technologies in the semiconductor field.
Conclusion
David Dutton's innovative work in integrated circuit manufacturing showcases his commitment to enhancing fabrication techniques. His contributions are vital to the ongoing evolution of semiconductor technology.