The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Oct. 04, 2004
Stephen E. Savas, Fremont, CA (US);
Songlin Xu, Fremont, CA (US);
David Dutton, Tracy, CA (US);
Andreas Kadavanich, Fremont, CA (US);
Rene George, San Jose, CA (US);
Stephen E. Savas, Fremont, CA (US);
Songlin Xu, Fremont, CA (US);
David Dutton, Tracy, CA (US);
Andreas Kadavanich, Fremont, CA (US);
Rene George, San Jose, CA (US);
Mattson Technology, Inc., Fremont, CA (US);
Abstract
In a technique for fabricating an integrated circuit to include an active device structure which supports an electrical interconnect structure, a photoresist layer is used prior to forming an electrical interconnect structure on the active device structure. The photoresist and related residues are removed by exposing the photoresist and exposed regions of the active device structure to one or more reactive species that are generated using a gas mixture including hydrogen gas, as a predominant source of the reactive species, in a plasma source such that the photoresist and residues are continuously exposed to hydrogen-based reactive species. An associated system architecture is described which provides for a substantial flow of hydrogen gas in the process chamber.