Company Filing History:
Years Active: 2007-2012
Title: David C Sing: Innovator in Semiconductor Technology
Introduction
David C Sing is a prominent inventor based in Austin, TX, recognized for his significant contributions to semiconductor technology. With a total of five patents to his name, Sing is actively engaged in innovative research that pushes the boundaries of electronic device functionality. His work primarily focuses on enhancing transistor performance through novel methods that address common semiconductor challenges.
Latest Patents
David C Sing's latest patents include:
1. **Method to Improve Source/Drain Parasitics in Vertical Devices** - This method describes a process for transistor fabrication that involves several steps, including providing a semiconductor structure with an overlying gate, removing portions of the structure to expose critical areas, and subjecting those areas to angled implants. This innovative technique aims to enhance the effectiveness of vertical device design by reducing parasitic effects, ultimately improving performance.
2. **Semiconductor Device with Integrated Resistive Element and Method of Making** - In this patent, Sing presents a resistive device and a transistor that leverage a portion of a metal layer formed during the same process. This method minimizes additional steps by treating the metal to increase its resistance. The incorporation of a polycrystalline semiconductor layer above the metal allows for the formation of a highly efficient resistive device. One approach described involves treating the metal with oxygen to enhance its resistivity, providing a versatile platform for various transistor structures.
Career Highlights
Throughout his career, David C Sing has made substantial strides in semiconductor innovation while working for Freescale Semiconductor, Inc. His expertise in fabricating advanced transistor technologies has positioned him as a key contributor in the field. His patents demonstrate his commitment to solving complex technical challenges and advancing semiconductor device design.
Collaborations
Sing's work is often enhanced through collaborations with fellow engineers and researchers. Notable coworkers, such as Leo Mathew and Venkat Kolagunta, have worked alongside him to push the envelope of semiconductor technology. Their combined expertise leads to greater innovation and the successful execution of advanced projects.
Conclusion
David C Sing embodies the spirit of innovation in the semiconductor industry. With his impressive portfolio of patents and collaborative efforts, he continues to make a lasting impact on the field of electronics. His inventions not only improve current technologies but also pave the way for future advancements in semiconductor devices.