David C Madoux

Title: David C. Madoux: Innovator in Photosensitive Technology

Introduction

David C. Madoux is a notable inventor based in Maryland Heights, MO (US), recognized for his contributions to the field of photosensitive technology. With a total of five patents to his name, Madoux has made significant advancements that enhance the performance and durability of photosensitive elements.

Latest Patents

One of his latest inventions is a photosensitive element having an overcoat which increases photo-speed. This innovative element comprises a support with a surface, a photosensitive layer, and a transparent protective coating. The photosensitive layer is made from a composition of an ethylenically unsaturated compound and a photo-initiator, enabling photo-initiated addition polymerization. The protective coating, which is PVA-based, is designed to be substantially impermeable to atmospheric oxygen. Notably, it has been discovered that the photo-speed is significantly enhanced when the coating contains an acid, particularly when the coating exhibits an acidic pH of less than about 5.5. Additionally, the protective coating may include a second polymer for surface hardness and scratch resistance, along with a plasticizer to enhance flexibility and prevent cracking.

Another significant patent is for a positive photoresist composition with naphthoquinonediazidesulfonate. This invention describes a radiation-sensitive oligomeric compound as the photoactive component, combined with a base-soluble phenolic matrix resin. This combination results in an improved photo-resist composition characterized by high light sensitivity, high resolution, excellent developer resistance, and remarkable resistance to thermal flow.

Career Highlights

Throughout his career, David C. Madoux has worked with reputable companies such as Shipley Company, L.L.C. and Western Litho Plate and Supply Company. His experience in these organizations has contributed to his expertise in the field of photosensitive technology.

Collaborations

Madoux has collaborated with notable individuals in his field, including Anthony Zampini and Peter Trefonas, III. These collaborations have likely enriched his work and led to further innovations in photosensitive technology.

Conclusion

David C. Madoux stands out as a significant figure in the realm of photosensitive technology, with a strong portfolio of patents that reflect his innovative spirit and dedication to advancing the field. His contributions continue to influence the development of new technologies in this area.