Shipley Company LLC

Western Litho Plate and Supply Company

David C Madoux

Peter Trefonas, Iii

Anthony Zampini

Charles R Szmanda

James C Woodbrey

Edward H Parker

Michael K Templeton

Brian K Daniels

This invention relates to a novel photosensitive element comprising: a support having a surface; a photosensitive layer on the surface; and a transparent, protective coating on the photosensitive layer. The photosensitive layer comprises a composition of an ethylenically unsaturated compound and a photo-initiator, and is capable of photo-initiated addition polymerization. The PVA-based protective coating is substantially impermeable to atmospheric oxygen. In accordance with this invention, it has been discovered that photo-speed in a photosensitive element is substantially enhanced if this coating contains a acid, and especially if the coating exhibits an acidic pH, preferably less than about 5.5. The protective coating preferably also contains a second polymer which imparts surface hardness and scratch resistance to the protective coating. The coating may further contain a plasticizer to impart flexibility and inhibit cracking and snow-flaking.

Photosensitive element having an overcoat which increases photo-speed

A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal flow.

Positive photoresist composition with naphthoquinonediazidesulfonate of

This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.

Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol

This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.

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Maryland Heights, MO, United States of America

David C Madoux