The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 1993

Filed:

Jun. 19, 1992
Applicant:
Inventors:

Anthony Zampini, St. Louis, MO (US);

David C Madoux, St. Louis, MO (US);

Peter Trefonas, III, St. Louis, MO (US);

Charles R Szmanda, St. Louis, MO (US);

Assignee:

Shipley Company Inc., Newton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430190 ; 430165 ; 430191 ; 430192 ; 430193 ; 430326 ; 534557 ;
Abstract

A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal flow.


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