The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1992
Filed:
Jan. 23, 1991
Applicant:
Inventors:
Michael K Templeton, St. Ann, MO (US);
Anthony Zampini, St. Louis, MO (US);
Peter Trefonas, III, St. Louis, MO (US);
James C Woodbrey, Chesterfield, MO (US);
David C Madoux, Maryland Heights, MO (US);
Brian K Daniels, Chesterfield, MO (US);
Assignee:
Shipley Company Inc., Newton, MA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430191 ; 430165 ; 430166 ; 430190 ; 430192 ; 430193 ;
Abstract
This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.