Saint Ann, MO, United States of America

Michael K Templeton

This inventor holds 1 USPTO granted patent. Top assignee: Shipley Company LLC. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael K Templeton. Retrieved from https://idiyas.com/inventor/michael-k-templeton-xbiobpda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Michael K Templeton: Innovator in Photoresist Technology

Introduction

Michael K Templeton is a notable inventor based in St. Ann, MO (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative patent. His work focuses on enhancing the performance and safety of photoresist compositions.

Latest Patents

Michael K Templeton holds a patent for a Quinone diazide containing photoresist composition. This invention is directed to novel photoresist processes and compositions that utilize high-resolution novolac resins. The photoactive components feature several diazoquinone groups per molecule, and the solvents used have a high solvency power. This innovation offers better safety, improved photospeed, higher contrast, and equivalent cast film thickness from lower percent solids formulations.

Career Highlights

Templeton is associated with Shipley Company LLC, where he applies his expertise in developing advanced photoresist materials. His work has contributed to the company's reputation for innovation in the semiconductor industry.

Collaborations

He has collaborated with notable coworkers, including Anthony Zampini and Peter Trefonas, III. Their combined efforts have furthered advancements in photoresist technology.

Conclusion

Michael K Templeton's contributions to photoresist technology exemplify the impact of innovative thinking in the field. His patent reflects a commitment to improving safety and performance in photoresist applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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