David Atchley

Title: Innovations of David Atchley

Introduction

David Atchley is a notable inventor based in Livermore, California. He has made significant contributions to the field of technology, particularly in the area of plasma reactors. With a total of two patents to his name, Atchley continues to push the boundaries of innovation.

Latest Patents

Atchley's latest patents include a "Deposition chamber system diffuser with increased power efficiency." This invention features a diffuser that includes a front-side gradient surface and a back-side gradient surface, along with opening structures designed to enhance power efficiency. Each opening structure consists of a conical opening and a cylindrical opening, arranged in alternating rows along the length of the diffuser block.

Another significant patent is the "Susceptor with roll-formed surface and method for making same." This invention provides an apparatus for supporting a large area substrate in a plasma reactor. The substrate support includes an electrically conductive body with a top surface that features a plurality of roll-formed indents, enhancing its functionality in plasma applications.

Career Highlights

David Atchley is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to develop innovative solutions that address complex challenges in plasma technology.

Collaborations

Atchley has collaborated with talented individuals such as Gaku Furuta and Soo Young Choi. These partnerships have contributed to the advancement of his inventions and the overall success of his projects.

Conclusion

David Atchley is a prominent inventor whose work in plasma technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to pushing the boundaries of technology.