The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Mar. 19, 2009
Applicants:
Gaku Furuta, Sunnyvale, CA (US);
David Atchley, Livermore, CA (US);
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Inventors:
Gaku Furuta, Sunnyvale, CA (US);
David Atchley, Livermore, CA (US);
Soo Young Choi, Fremont, CA (US);
John M. White, Hayward, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4581 (2013.01);
Abstract
The present invention generally provides apparatus for supporting a large area substrate in a plasma reactor. One embodiment, a substrate support for using in a plasma reactor includes an electrically conductive body has a top surface with a plurality of roll-formed indents.