Applied Materials, Inc.

David Atchley

Soo Young Choi

Gaku Furuta

John M White

Robin L Tiner

Lai Zhao

Changling Li

Ganesh Babu Chandrasekaran

A diffuser includes a front-side gradient surface formed from a diffuser block, a back-side gradient surface formed from the diffuser block, and opening structures formed from the front-side gradient surface to the back-side gradient surface. Each opening structure includes a conical opening having a first end along the front-side gradient surface and a second end corresponding to an apex at a depth within the diffuser block, and a cylindrical opening formed from the depth to the back-side gradient surface. The opening structures are arranged in rows including a first set of rows and a second set of rows alternately positioned along a length of the diffuser block.

Deposition chamber system diffuser with increased power efficiency

The present invention generally provides apparatus for supporting a large area substrate in a plasma reactor. One embodiment, a substrate support for using in a plasma reactor includes an electrically conductive body has a top surface with a plurality of roll-formed indents.

Susceptor with roll-formed surface and method for making same

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Livermore, CA, United States of America

David Atchley