David Angst

Title: The Innovative Contributions of David Angst

Introduction

David Angst is a notable inventor based in New Tripoli, PA (US). He has made significant contributions to the field of microelectronics, particularly in cleaning compositions for post-chemical mechanical polishing (CMP) processes. With a total of 5 patents to his name, Angst has demonstrated a commitment to innovation and excellence in his work.

Latest Patents

One of David Angst's latest patents focuses on antioxidants for post-CMP cleaning formulations. This invention presents a cleaning composition and process designed to effectively remove CMP residue and contaminants from microelectronic devices. The cleaning compositions include novel corrosion inhibitors, ensuring that the cleaning process does not compromise the low-k dielectric material or the copper interconnect material. This innovative approach achieves highly efficacious cleaning of post-CMP residue and contaminant material, showcasing Angst's expertise in the field.

Career Highlights

Throughout his career, David Angst has worked with prominent companies such as Advanced Technology Materials, Inc. and Agere Systems Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in microelectronics. Angst's work has been instrumental in developing solutions that address critical challenges in the industry.

Collaborations

David Angst has collaborated with talented individuals in his field, including Peng Zhang and Jeffrey A. Barnes. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies.

Conclusion

David Angst's contributions to the field of microelectronics through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to impact the industry positively, paving the way for future advancements in cleaning compositions and processes.