Company Filing History:
Years Active: 2013-2015
Title: Innovations of Dave Hetzer
Introduction
Dave Hetzer is an accomplished inventor based in Schenectady, NY (US). He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work primarily focuses on advanced lithographic techniques that enhance the precision and efficiency of patterning processes.
Latest Patents
Hetzer's latest patents include innovative methods that push the boundaries of current technologies. One of his notable patents is titled "Double patterning with inline critical dimension slimming." This method describes a litho/freeze/litho/etch (LFLE) technique that incorporates a critical dimension (CD) slimming process. This process reduces the first CD to a first reduced CD and the second CD to a second reduced CD, thereby improving the overall patterning accuracy. Another significant patent is "Sidewall image transfer pitch doubling and inline critical dimension slimming." This method involves performing a lithographic process to create a pattern, followed by a CD slimming process that reduces the CD in the pattern. The pattern is then doubled using a sidewall image transfer technique, showcasing Hetzer's innovative approach to semiconductor fabrication.
Career Highlights
Dave Hetzer is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His expertise in lithographic techniques has positioned him as a valuable asset to the organization. Throughout his career, Hetzer has consistently demonstrated a commitment to advancing technology and improving manufacturing processes.
Collaborations
Hetzer has collaborated with notable colleagues, including Shannon W Dunn and Shinichiro Kawakami. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
In summary, Dave Hetzer is a prominent inventor whose work in semiconductor manufacturing has led to several impactful patents. His innovative methods continue to shape the industry and enhance the capabilities of lithographic processes.