Boulder, CO, United States of America

Dave Craig Winters

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Dieterich Standard, Inc.. Active years: 2016.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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2 patents (USPTO):Explore Patents

Title: Innovations by Dave Craig Winters

Introduction

Dave Craig Winters is an accomplished inventor based in Boulder, CO. He has made significant contributions to the field of process measurement systems, holding a total of 2 patents. His work focuses on enhancing the efficiency and reliability of fluid measurement technologies.

Latest Patents

One of his latest patents is the "Lugged Wafer Alignment Ring." This invention discloses systems, apparatus, and methods for coupling a wafer-style primary element of a process measurement system between process pipes. It ensures that the primary element aligns with the process pipes while maintaining alignment and preventing leaks, even in the event of dynamic shocks to the pipes. Another notable patent is the "Process Fluid Flow Transmitter with Finned Coplanar Process Fluid Flange." This system includes a process fluid pressure transmitter with a pair of coplanar process fluid ports on its bottom surface. It is designed to measure differential pressure between these ports and provide an indication of the measured pressure over a communication loop.

Career Highlights

Dave Craig Winters is currently employed at Dieterich Standard, Inc., where he continues to innovate in the field of process measurement. His expertise and inventions have contributed to advancements in fluid measurement technologies.

Collaborations

Throughout his career, Dave has collaborated with notable colleagues, including Donald Robert Verhaagen and John Henry Stehle. Their combined efforts have furthered the development of innovative solutions in their field.

Conclusion

Dave Craig Winters is a prominent inventor whose work has significantly impacted process measurement systems. His patents reflect his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
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