Dieterich Standard, Inc.

Dave Craig Winters

Paul Timothy Deegan

John Henry Stehle

Donald Robert Verhaagen

Steve Harbaugh

Systems, apparatus and methods are disclosed for coupling a wafer style primary element of a process measurement system between process pipes in a manner which aligns the primary element with the process pipes, while maintaining alignment and preventing leaking in the event of a dynamic shock to the process pipes.

Lugged wafer alignment ring

A process fluid pressure measurement system is provided. The system includes a process fluid pressure transmitter having a pair of process fluid ports disposed coplanar with one another on a bottom surface thereof. The process fluid pressure transmitter is configured to measure a differential pressure between the pair of process fluid ports and provide an indication of the measured differential pressure over a process communication loop. A process fluid flange has a first surface configured to mount to the surface of the process fluid pressure transmitter, a second surface opposed to the first surface, and at least one lateral sidewall extending between the first and second surface. A plurality of fins are disposed proximate the lateral surface.

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Boulder, CO, United States of America

Dave Craig Winters