Mentor, OH, United States of America

Davd G Schwarz

This inventor holds 1 USPTO granted patent. Top assignee: H.c. Starck Gmbh. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Davd G Schwarz. Retrieved from https://idiyas.com/inventor/davd-g-schwarz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 12.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Davd G Schwarz

Introduction

Davd G Schwarz is a notable inventor based in Mentor, OH (US). He has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. His work has implications for various electronic components, showcasing his expertise and innovative spirit.

Latest Patents

Davd G Schwarz holds a patent for "Molybdenum tubular sputtering targets with uniform grain size and texture." This invention focuses on molybdenum sputtering targets characterized by minimal texture banding and a uniform through-thickness gradient. The high-purity sputtering targets can be micro-alloyed to enhance performance. They can be produced in various shapes, including round discs, squares, rectangles, or tubular forms, and are capable of forming thin films on substrates. The segment-forming method allows for sputtering targets to reach sizes of up to 6 m × 5.5 m. These thin films are applicable in electronic components such as Thin Film Transistor-Liquid Crystal Displays, Plasma Display Panels, Organic Light Emitting Diodes, Inorganic Light Emitting Diode Displays, Field Emitting Displays, solar cells, sensors, semiconductor devices, and gate devices for CMOS with tunable work functions.

Career Highlights

Davd G Schwarz is associated with H.C. Starck GmbH, where he continues to innovate and contribute to the field of materials science. His work has led to advancements in the production of sputtering targets, which are essential for various high-tech applications.

Collaborations

Throughout his career, Davd has collaborated with notable colleagues, including Prabhat Kumar and Peter R Jepson. These collaborations have further enriched his research and development efforts.

Conclusion

Davd G Schwarz's contributions to the field of sputtering targets exemplify his innovative approach and dedication to advancing technology. His patent reflects a significant step forward in materials science, impacting various electronic applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…