H.c. Starck Gmbh

Davd G Schwarz

Steven Alfred Miller

Gary Alan Rozak

Prabhat Kumar

Peter R Jepson

Richard Wu

Joseph Hirt

David Meendering

Jerome O'Grady

Timothy Welling

Brad Lemon

James G Daily, Iii

Molybdenum, sputtering targets and sintering characterized as having no or minimal texture banding or through thickness gradient. The molybdenum sputtering targets having a fine, uniform grain size as well as uniform texture, are high purity and can be micro-alloyed to improved performance. The sputtering targets can be round discs, square, rectangular or tubular and can be sputtered to form thin films on substrates. By using a segment-forming method, the size of the sputtering target can be up to 6 m&#xd7;5.5 m. The thin films can be used in electronic components such as Thin Film Transistor-Liquid Crystal Displays, Plasma Display Panels, Organic Light Emitting Diodes, Inorganic Light Emitting Diode Displays, Field Emitting Displays, solar cells, sensors, semiconductor devices, and gate device for CMOS (complementary metal oxide semiconductor) with tunable work functions.

Molybdenum tubular sputtering targets with uniform grain size and texture

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Mentor, OH, United States of America

Davd G Schwarz