Company Filing History:
Years Active: 2004-2018
Title: The Innovative Contributions of Darren M. Simonelli
Introduction
Darren M. Simonelli is a notable inventor based in Seabrook, NH, who has made significant contributions to the field of chemical vapor deposition (CVD) systems. With a total of five patents to his name, Simonelli's work focuses on enhancing the efficiency and effectiveness of substrate processing technologies.
Latest Patents
One of Simonelli's latest patents is a "Showerhead Apparatus for a Linear Batch Chemical Vapor Deposition System." This innovative apparatus features a movable showerhead, multiple gas supply conduits, and a translation mechanism. The design allows for precise distribution of precursor gas to the surfaces of substrates, significantly reducing parasitic deposition within the chamber. This advancement leads to improved thickness uniformity and device yield during the deposition process.
Another significant patent is the "Parallel Batch Chemical Vapor Deposition System." This system includes two linear deposition chambers arranged in parallel, along with a robotic loading module. The design ensures uniform gas distribution and temperature control across the substrates, making it suitable for high-volume processing. The flexibility of this system allows for different CVD processes to be performed in each chamber, enhancing its versatility.
Career Highlights
Throughout his career, Simonelli has worked with several companies, including Semigear, Inc. and Aventa Technologies, Inc. His experience in these organizations has contributed to his expertise in developing advanced CVD technologies.
Collaborations
Simonelli has collaborated with notable professionals in the field, including Piero Sferlazzo and Chunghsin Lee. These collaborations have further enriched his work and contributed to the advancement of CVD systems.
Conclusion
Darren M. Simonelli's innovative patents and contributions to the field of chemical vapor deposition highlight his role as a leading inventor. His work continues to influence the industry, paving the way for more efficient substrate processing technologies.
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