Company Filing History:
Years Active: 2009-2019
Title: Darko Babic: Innovator in Thin Film Deposition Technology
Introduction
Darko Babic is a notable inventor based in Chandler, AZ, who has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of four patents to his name, Babic has focused on developing advanced systems for growing thin films, which are essential in various applications, including semiconductor manufacturing.
Latest Patents
One of Babic's latest patents is a reaction system for growing a thin film. This atomic deposition apparatus includes a deposition chamber designed to deposit a thin film on a wafer mounted within a defined space. The chamber features a gas inlet that communicates with the space, and a gas system that delivers gas to the gas inlet. Notably, a portion of the gas system is positioned above the deposition chamber, and it includes a mixer that is capable of mixing multiple gas streams. Additionally, a transfer member is in fluid communication with the mixer and the gas inlet, featuring a pair of horizontally divergent walls that spread the gas in a horizontal direction before it enters the gas inlet.
Career Highlights
Throughout his career, Darko Babic has worked with prominent companies in the technology sector, including ASML and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his expertise in thin film deposition and contribute to innovative solutions in the industry.
Collaborations
Babic has collaborated with talented individuals such as Mohith E Verghese and Kyle Fondurulia, further enhancing his work in the field of atomic layer deposition.
Conclusion
Darko Babic stands out as an influential inventor in the realm of thin film deposition technology. His patents and career achievements reflect his commitment to innovation and excellence in the industry.