Danying Wang

Title: Danying Wang: Innovator in Substrate Cleaning Technologies

Introduction

Danying Wang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of substrate cleaning technologies. With a total of 3 patents to his name, Wang's work focuses on innovative methods and apparatuses that enhance cleaning processes.

Latest Patents

Wang's latest patents include a method and apparatus for cleaning substrates using high-temperature chemicals and ultrasonic devices. This method involves rotating a substrate and delivering deionized water to pre-wet its surface. It also includes the application of a high-temperature chemical solution for effective cleaning. The process is further enhanced by adjusting the rotation speed and utilizing an ultrasonic device in multiple cleaning cycles. The apparatus comprises a high-temperature chemical solution supply system, which includes a solution tank, a buffer tank, and pumps to facilitate the cleaning process.

Career Highlights

Danying Wang is currently employed at Acm Research (Shanghai) Inc. His work at this company has allowed him to develop and refine his innovative cleaning technologies. Wang's expertise in this area has positioned him as a key figure in the advancement of substrate cleaning methods.

Collaborations

Wang collaborates with talented individuals such as Fuping Chen and Hui Wang. Their combined efforts contribute to the development of cutting-edge technologies in the field.

Conclusion

Danying Wang's contributions to substrate cleaning technologies demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to advancing the efficiency and effectiveness of cleaning methods.