Meridian, ID, United States of America

Danny Dynka


Average Co-Inventor Count = 2.2

ph-index = 9

Forward Citations = 1,237(Granted Patents)


Location History:

  • Boise, ID (US) (1996 - 1998)
  • Meridan, ID (US) (1997 - 1999)
  • Meridian, OH (US) (2001)
  • Meridian, ID (US) (2000 - 2010)

Company Filing History:


Years Active: 1996-2010

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22 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Danny Dynka

Introduction

Danny Dynka, an accomplished inventor based in Meridian, ID, holds an impressive portfolio of 22 patents. His innovative work in the field of atomic layer deposition and semiconductor technology has made significant contributions to various industries, showcasing his expertise as an inventor.

Latest Patents

Among his latest patents, one notable invention includes an **atomic layer deposition method of depositing an oxide on a substrate**. This method involves placing a substrate within a deposition chamber where a first species is chemisorbed onto the substrate to create a monolayer. The process is enhanced by the use of remote plasma oxygen and nitrogen, which effectively react with the chemisorbed first species to form a porous oxide on the substrate. The systematic repetition of these steps facilitates a precise and controlled deposition process.

Another significant invention is related to **substrate susceptors for receiving semiconductor substrates to be deposited upon**. This patent outlines a substrate susceptor designed for selective epitaxial silicon deposition. The unique feature of this design allows for non-contact emissivity measurements from specific locations on the susceptor, ensuring that selective epitaxial silicon deposition occurs accurately and efficiently on the semiconductor substrate.

Career Highlights

Danny Dynka has worked with leading companies in the technology industry, including Micron Technology and Micron Display Technology, Inc. His experience within these organizations has enabled him to refine his skills in semiconductor technology and materials science, ultimately supporting his success as an inventor.

Collaborations

Throughout his career, Dynka has collaborated with notable professionals such as Charles Martin Watkins and David A. Cathey. These collaborations have not only expanded his network but also fostered the exchange of ideas that contribute to his innovative projects.

Conclusion

Danny Dynka's contributions to the field of technology and innovation, particularly in atomic layer deposition and semiconductor technology, showcase his dedication and expertise as an inventor. With a growing portfolio of patents and a solid career background, he continues to influence the future of these industries, paving the way for further advancements.

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