Danny Chien Lu

Title: The Innovative Contributions of Danny Chien Lu

Introduction

Danny Chien Lu is a prominent inventor based in Gilroy, CA (US). He has made significant contributions to the field of technology, particularly in the area of semiconductor processing. With a total of 10 patents to his name, Lu's work has had a substantial impact on the industry.

Latest Patents

One of Lu's latest patents is focused on methods of non-destructive post tungsten etch residue removal. This invention relates to techniques for cleaning a substrate surface that has refractory metal portions using water vapor plasma treatment. The method involves positioning a substrate in a processing chamber, forming a process gas that includes water vapor, and maintaining a specific process pressure to create an activated water vapor that effectively cleans the refractory metal.

Another notable patent involves a process chamber component that features an electroplated yttrium-containing coating. This component is designed to withstand exposure to plasma in a process chamber. The electroplated coating is resistant to corrosion and can include various species, enhancing its durability and effectiveness in semiconductor applications.

Career Highlights

Danny Chien Lu is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop innovative solutions that address critical challenges in semiconductor manufacturing.

Collaborations

Lu has collaborated with several talented individuals in his field, including coworkers Hong Shih and Nianci Han. These collaborations have contributed to the advancement of technology and the successful development of his patented inventions.

Conclusion

Danny Chien Lu's innovative work and numerous patents highlight his significant contributions to the semiconductor industry. His inventions continue to influence the field and pave the way for future advancements.