The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Jun. 21, 2007
Applicants:
Nianci Han, San Jose, CA (US);
LI Xu, San Jose, CA (US);
Hong Shih, Walnut, CA (US);
Yang Zhang, Albany, CA (US);
Danny LU, Milpitas, CA (US);
Jennifer Y. Sun, Sunnyvale, CA (US);
Inventors:
Nianci Han, San Jose, CA (US);
Li Xu, San Jose, CA (US);
Hong Shih, Walnut, CA (US);
Yang Zhang, Albany, CA (US);
Danny Lu, Milpitas, CA (US);
Jennifer Y. Sun, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/10 (2006.01); C25D 5/50 (2006.01); C25D 3/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a component capable of being exposed to a plasma in a process chamber comprises forming a structure comprising a surface and electroplating yttrium, and optionally aluminum or zirconium, onto the surface. Thereafter, the electroplated layer can be annealed to oxide the yttrium and other electroplated species.