San Jose, CA, United States of America

DanJing Huang

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: DanJing Huang. Retrieved from https://idiyas.com/inventor/danjing-huang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovations of DanJing Huang

Introduction

DanJing Huang is a notable inventor based in San Jose, California. He has made significant contributions to the field of beam monitoring technology. His work is characterized by a focus on improving inspection systems through innovative methods and apparatus.

Latest Patents

DanJing Huang holds a patent for a "Method and apparatus for monitoring beam profile and power." This invention provides a system and method for monitoring a beam in an inspection system. The system includes an image sensor that collects a sequence of images of a beam spot formed on a surface. Each image is captured at a different exposure time, and a controller combines these images to obtain a comprehensive beam profile.

Career Highlights

DanJing Huang is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML focuses on advancing technologies that enhance the efficiency and accuracy of inspection systems.

Collaborations

Some of his notable coworkers include Bin-Da Chan and Ning Ye. Their collaborative efforts contribute to the innovative environment at ASML, fostering advancements in technology.

Conclusion

DanJing Huang's contributions to beam monitoring technology exemplify the impact of innovation in the semiconductor industry. His patent and work at ASML highlight the importance of continuous improvement in inspection systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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