This inventor holds 3 USPTO granted patents and 3 published patent applications and 3 EPO patents. Top assignee: Fei Comapny. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Title: The Innovative Contributions of Daniel Totonjian
Introduction
Daniel Totonjian is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of analytical methods through his innovative patent. His work focuses on enhancing the capabilities of particle-induced x-ray emission (PIXE) using advanced ion beam technology.
Latest Patents
Daniel Totonjian holds a patent for "Particle-induced x-ray emission (PIXE) using hydrogen and multi-species focused ion beams." This patent describes a practical implementation of PIXE on a focused ion beam apparatus or a dual-beam apparatus that combines both focused-ion beam and scanning microscopy capabilities. The analytical method involves directing and focusing a beam of ions, which includes a mixture of protons and non-hydrogen ions, onto a sample. The kinetic energy of the ions in the mixture is not greater than 50 kilo-electron-Volts (keV). The method also includes detecting and measuring X-rays emitted from the sample in response to the impingement of the ions.
Career Highlights
Daniel is associated with Fei Company, where he applies his expertise in ion beam technology. His innovative approach has contributed to advancements in analytical methods, making significant impacts in his field. He has a total of 1 patent to his name, showcasing his dedication to innovation.
Collaborations
Daniel has collaborated with notable colleagues, including Aurelien Philippe Jean Maclou Botman and Milos Toth. These collaborations have further enriched his work and contributed to the development of advanced analytical techniques.
Conclusion
Daniel Totonjian's contributions to the field of particle-induced x-ray emission demonstrate his commitment to innovation and analytical advancements. His work continues to influence the industry and inspire future developments in ion beam technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
