The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Apr. 25, 2022
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Daniel Totonjian, Portland, OR (US);

Aurelien Philippe Jean Maclou Botman, Hillsboro, OR (US);

Milos Toth, Redfern, AU;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/22 (2018.01); G01N 23/20 (2018.01); G01N 23/203 (2006.01); G01N 23/2206 (2018.01); G01N 23/2252 (2018.01); G01N 23/2257 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2206 (2013.01); G01N 23/203 (2013.01); G01N 23/2252 (2013.01); G01N 23/2257 (2013.01);
Abstract

Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.


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