Aalen, Germany

Daniel Seitz

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Daniel Seitz

Introduction

Daniel Seitz is an accomplished inventor based in Aalen, Germany. He has made significant contributions to the field of semiconductor lithography. His innovative approach has led to the development of a unique method for measuring actuators in projection exposure apparatuses.

Latest Patents

Daniel Seitz holds 1 patent for his invention titled "Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithography." This patent describes a method for measuring an actuator in a projection exposure apparatus. The process involves driving and deflecting a first actuator with a constant control signal, deflecting a further actuator through mechanical coupling, and determining the capacitance of the further actuator that was deflected by this coupling. The invention also includes a projection exposure apparatus equipped with a control device and a measuring device designed to determine the capacitance of at least one actuator.

Career Highlights

Daniel Seitz is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and semiconductor manufacturing. His work at this prestigious organization has allowed him to further his research and development in advanced technologies.

Collaborations

Throughout his career, Daniel has collaborated with notable colleagues, including Markus Raab and Mohammad Awad. These partnerships have contributed to the advancement of innovative solutions in the semiconductor industry.

Conclusion

Daniel Seitz's contributions to semiconductor lithography through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
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