The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2026
Filed:
Mar. 24, 2023
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Markus Raab, Schillingsfuerst, DE;
Mohammad Awad, Heidenheim, DE;
Matthias Manger, Aalen-Unterkochen, DE;
Bastian Keller, Sontheim, DE;
Annika Rief, Aalen, DE;
Daniel Seitz, Aalen, DE;
Alexander Vogler, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.