Aalen, Germany

Annika Rief

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Annika Rief: Innovator in Semiconductor Lithography

Introduction

Annika Rief is a prominent inventor based in Aalen, Germany. She has made significant contributions to the field of semiconductor lithography, showcasing her expertise through her innovative patents. Her work is instrumental in advancing technology in this critical area.

Latest Patents

Annika Rief holds a patent titled "Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithography." This patent describes a method for measuring an actuator in a projection exposure apparatus, which includes driving and deflecting a first actuator with a constant control signal, deflecting a further actuator through mechanical coupling, and determining the capacitance of the further actuator. This invention is crucial for enhancing the precision and efficiency of semiconductor manufacturing processes.

Career Highlights

Annika Rief is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and semiconductor manufacturing. Her role at the company allows her to apply her innovative ideas and contribute to cutting-edge technology in semiconductor lithography.

Collaborations

Throughout her career, Annika has collaborated with notable colleagues, including Markus Raab and Mohammad Awad. These collaborations have further enriched her work and contributed to advancements in the field.

Conclusion

Annika Rief is a remarkable inventor whose contributions to semiconductor lithography are noteworthy. Her innovative patent and work at Carl Zeiss SMT GmbH highlight her significant role in advancing technology in this essential industry.

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