Braunschweig, Germany

Daniel Rademacher

This inventor holds 2 USPTO granted patents and 1 published patent application, plus 1 CIPO patent and 3 EPO patents. Top assignee: Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.. Active years: 2017-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Rademacher. Retrieved from https://idiyas.com/inventor/daniel-rademacher

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0


 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017-2025

Loading Chart...
Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel Rademacher

Introduction

Daniel Rademacher is a notable inventor based in Braunschweig, Germany. He has made significant contributions to the field of optical precision films and low-particle layer production. With a total of 2 patents, Rademacher's work is recognized for its high precision and innovative methodologies.

Latest Patents

Rademacher's latest patents include a "Method and device for producing uniform films on moving substrates." This invention focuses on the deposition of optical precision films with high uniformity, precision, and low absorption on substrates. The method utilizes target materials in the sputtering field to achieve particularly high uniformity and low residual absorption. This invention is particularly applicable in the production of optical thin-film filters used in laser material machining, optical sensors, and medical diagnostics.

Another significant patent is the "Method and apparatus for producing low-particle layers on substrates." This invention describes methods and devices for creating low-particle layers in a vacuum using magnetron sputtering. The layers are deposited from a cylindrical source material, potentially combined with a reactive gas component. The innovative sputter-up method allows for the deposition of layers against the force of gravity, enabling modifications to the structure or atomic composition of the layers using a plasma source.

Career Highlights

Throughout his career, Rademacher has worked with esteemed organizations such as the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. and W. Blosch AG. His experience in these institutions has contributed to his expertise in the field of optical technologies.

Collaborations

Rademacher has collaborated with notable professionals, including Michael Vergöhl and Hans-Ulrich Kricheldorf. These collaborations have further enriched his work and innovations in the field.

Conclusion

Daniel Rademacher's contributions to the field of optical precision films and low-particle layer production highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to precision and quality in optical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…